The TSV process is currently mainly used in silicon interposer, WLP packaging of MEMS/CIS/fingerprint chips, and 3D packaging of digital chips such as memory chips. The main technical indicators of the TSV process are aspect ratio, minimum hole spacing, etc. At present, the TSV process has achieved a 10:1 aspect ratio straight hole, and the deep hole TSV can be mass-produced, and the metal in the hole is filled with no holes. The remaining 3:1 straight hole TSV and other via last processes can also be mass-produced and passed the reliability test.