How To Build Resilience Into Chips
Heterogeneous designs, customization, and increasing complexity open doors for hardware errors.
From Lab To Fab: Increasing Pressure To Fuse IC Processes
Efforts mount to connect metrology, test, and inspection across both worlds as chips become more complex and expensive.
Using AI To Improve Metrology Tooling
Virtual metrology shows benefits in limited trials, but much work still needs to be done.
True 3D Is Much Tougher Than 2.5D
While terms often are used interchangeably, they are very different technologies with different challenges.
Metrology Strategies For 2nm Processes
Tools become more specific for Si/SiGe stacks, 3D NAND, and bonded wafer pairs.
How Chip Engineers Plan To Use AI
Checks, balances, and unknowns for AI/ML in semiconductor design.
Stacking logic requires solving some hidden issues; concerns about thermal dissipation may be the least of them.
New Standards Push Co-Packaged Optics
Speed, density, distance, and heat all need to be considered; pluggables still have a future.
IC Security Issues Grow, Solutions Lag
Signing off on hardware security may involve lifetime updates; AI adds unknowns that are difficult to trace.
Assist Layers: The Unsung Heroes Of EUV Lithography
Various materials work in concert with the scanner, photoresist and photomasks to make EUV lithography work.
Address:
Singapore - 108 Keng Lee Road, #03-01, Keng Lee View, Singapore 219268
USA - Henderson, NV 89053,PHONE 510-209-9371
Hongkong - Flat/RM 1205, 12/F, Tai Sang Bank Building, 130-132 Des Voeux Road Central, Hongkong
Changsha - 3005 Unit A, Yage International, Yuelu District, 410000 Changsha